Polarizer stencil mask: The present disclosure relates to a stencil mask and a method for defining patterns on substrates, suitable for fabrication of nanoscale devices, semiconductor devices, biological applications, flexible electronics or photonics.

Michaela Eichinger* (Opfinder), Thomas Kanne (Opfinder), Tobias Skov Særkjær (Opfinder), Morten Kjaergaard (Opfinder), Peter Krogstrup (Opfinder)

*Corresponding author af dette arbejde

Publikation: Patent

OriginalsprogEngelsk
PatentnummerP6493PC00
Land/OmrådeDanmark
StatusAfsendt - aug. 2023

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