Abstract
Relaxation and dephasing of hole spins are measured in a gate-defined Ge/Si nanowire double quantum dot using a fast pulsed-gate method and dispersive readout. An inhomogeneous dephasing time T2(*)≈ 0.18 μs exceeds corresponding measurements in III-V semiconductors by more than an order of magnitude, as expected for predominately nuclear-spin-free materials. Dephasing is observed to be exponential in time, indicating the presence of a broadband noise source, rather than Gaussian, previously seen in systems with nuclear-spin-dominated dephasing.
| Original language | English |
|---|---|
| Journal | Nano Letters |
| Volume | 14 |
| Issue number | 3582 |
| Pages (from-to) | 3582-3586 |
| Number of pages | 4 |
| ISSN | 1530-6984 |
| DOIs | |
| Publication status | Published - 5 May 2014 |
Bibliographical note
Preprint available at http://arxiv.org/abs/1403.2093.Cite this
- APA
- Standard
- Harvard
- Vancouver
- Author
- BIBTEX
- RIS