Nanometer-scale scanning sensors fabricated using stencil lithography

A R Champagne; A J Couture; Ferdinand Kuemmeth; D C Ralph

doi:10.1063/1.1554483

Nanometer-scale scanning sensors fabricated using stencil lithography

A R Champagne, A J Couture, Ferdinand Kuemmeth, D C Ralph

Research output: Contribution to journal › Journal article › Research › peer-review

48 Citations (Scopus)

700 Downloads (Pure)

Abstract

We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.

Original language	English
Journal	Applied Physics Letters
Volume	82
Issue number	7
Pages (from-to)	1111
Number of pages	3
ISSN	0003-6951
DOIs	https://doi.org/10.1063/1.1554483
Publication status	Published - 1 Jan 2003
Externally published	Yes

Access to Document

10.1063/1.1554483

Kuemmeth APL 2003Final published version, 596 KB

http://dx.doi.org/10.1063/1.1554483

Cite this

@article{b16d73f7bcf74697a7e0aca1d933764e,

title = "Nanometer-scale scanning sensors fabricated using stencil lithography",

abstract = "We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.",

author = "Champagne, {A R} and Couture, {A J} and Ferdinand Kuemmeth and Ralph, {D C}",

year = "2003",

month = jan,

day = "1",

doi = "10.1063/1.1554483",

language = "English",

volume = "82",

pages = "1111",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "7",

}

TY - JOUR

T1 - Nanometer-scale scanning sensors fabricated using stencil lithography

AU - Champagne, A R

AU - Couture, A J

AU - Kuemmeth, Ferdinand

AU - Ralph, D C

PY - 2003/1/1

Y1 - 2003/1/1

N2 - We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.

AB - We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.

U2 - 10.1063/1.1554483

DO - 10.1063/1.1554483

M3 - Journal article

VL - 82

SP - 1111

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 7

ER -