Nanometer-scale scanning sensors fabricated using stencil lithography

A R Champagne; A J Couture; Ferdinand Kuemmeth; D C Ralph

doi:10.1063/1.1554483

Nanometer-scale scanning sensors fabricated using stencil lithography

A R Champagne, A J Couture, Ferdinand Kuemmeth, D C Ralph

Research output: Contribution to journal › Journal article › Research › peer-review

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Abstract

We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.

Original language	English
Journal	Applied Physics Letters
Volume	82
Issue number	7
Pages (from-to)	1111
Number of pages	3
ISSN	0003-6951
DOIs	https://doi.org/10.1063/1.1554483
Publication status	Published - 1 Jan 2003
Externally published	Yes

Access to Document

10.1063/1.1554483

Kuemmeth APL 2003Final published version, 596 KB

http://dx.doi.org/10.1063/1.1554483

Cite this

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title = "Nanometer-scale scanning sensors fabricated using stencil lithography",

abstract = "We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.",

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AU - Couture, A J

AU - Kuemmeth, Ferdinand

AU - Ralph, D C

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AB - We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.

U2 - 10.1063/1.1554483

DO - 10.1063/1.1554483

M3 - Journal article

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JO - Applied Physics Letters

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